Abstract

Using a TEM equipped with an electron energy loss spectrometer (EELS) the plasmon energy, Ep of a material can easily be determined for specimens of thickness up to a few thousand Å. This coincides with the film thicknesses encountered in thin film technology, e.g., amorphous solar cells. Ep is to the first approximation proportional to the square root of the valence electron density, and is thus sensitive to the chemical composition and the density of a material. Ep measurements using EELS have therefore the potential of being a convenient way of characterizing a material, as has been demonstrated for hydrogenated metals, and this could be particularly useful for amorphous materials where characterization techniques such as x-ray and electron diffraction are of limited value.

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