Abstract
Optical surfaces with antireflective structures show excellent optical properties for a wide range of light incidence angles. Suitable structures can be generated on PMMA by an optimized plasma etching process. The chemical composition of PMMA modified using plasma was studied with infrared reflection absorption spectroscopy (IRRAS). The investigations indicate a change of chemical composition even during the first few seconds of plasma etching. It is assumed that the modified surface layer is essentially involved in the structure formation process.
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