Abstract
A plasma sputter type of negative ion source with an electron cyclotron resonance (ECR) discharge has been developed at KEK. The ECR discharge was produced by a 2.45-GHz microwave. In this ion source, negative heavy ions are produced at the surface of the metal which is placed in a Xe plasma confined by a cusp magnetic field. In preliminary experiments, the beam current of 7 mA for Cu− was obtained in pulsed mode operation.
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