Plasma sputter multicusp negative/positive ion source with ECR discharge

Abstract

A plasma sputter type of negative and positive ion source with electron cyclotron resonance (ECR) discharge has been developed at KEK. The ECR discharge was produced by a 2.45 GHz microwave source. In this ion source, negative heavy ions are produced at the surface of the metal which is placed in a Xe gas plasma confined in a cusp magnetic field. Positive ions are generated by ionizing of sputtered neutral atoms in the ECR discharge. The microwave is introduced into the source through a sputter target using a waveguide type of microwave transformer.