Abstract
We report herein the characterizations of thiophene and pyrrole composite thin films synthesized by using a plasma based electron beam generator which has a fast filamentary discharge formed from the superposition of an ordinary low-pressure dc glow discharge and high-current pulsed one. Glass and ITO (indium tin oxide) substrates were coated at a pressure of 1 mbar, 19 kV pulsed and 2 kV dc potential. The substrates were located at different regions in the reactor to evaluate the influence of the position on the molecular structure of the obtained thin films. To our knowledge, such composite thin films are synthesized for the first time by such technique.
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