Abstract
New experiments in plasma immersion ion implantation (PIII) were performed to explore the extended operation regimes available with pulsed plasmas. A pulsed extraction voltage and a synchronized pulsed plasma show a further reduction of thermal load, more stable operation and improved implantation results. It was even possible to run PIII in a mode with pulsed plasma and a d.c. voltage, omitting the costly high voltage modulating unit. Time resolved measurements of plasma density and electron temperature were performed to get information about the plasma build-up and decay process. In all cases a space charge sheath forms around the sample across which the ions are accelerated. The extension of the sheath was measured using time resolved Langmuir probe measurements. Iron and aluminium samples were implanted with nitrogen using a d.c. plasma/pulsed extraction voltage; pulsed plasma/pulsed extraction voltage; and pulsed plasma/d.c. extraction voltage. Analysis of the treated samples showed that in all cases nitrogen was implanted.
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