Abstract
The basis of a lithographic technique for producing glassy structures of diffractive optics, integrated optics, microfluidics, plasmonics, etc., is presented. The technique is based on the integration of two “dry” procedures: (1) glass polarization with structured (with relief surface) anodic electrode and (2) plasma-chemical etching of the poled glass. A pilot relief structure (that is, relief pattern 0.5 μm in depth) on the glass surface has been produced with the proposed technique.
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