Abstract
Titanium dioxide (TiO 2) films were deposited on unheated non-alkali glass substrates by reactive mid-frequency (mf) magnetron sputtering using dual cathodes with two Ti metal targets. In order to achieve a very high deposition rate, the depositions were carried out in the ‘transition region’ between the metallic and the reactive (oxide) sputter mode where the target surface was metallic and oxidized, respectively. Stable deposition was successfully carried out in the whole transition region at both total pressures of 1 Pa and 3 Pa, using the plasma control unit (PCU). The highest deposition rate in this study for the photocatalytic TiO 2 films deposited in the transition region was over 30 nm/min, which was larger than that for the conventional sputter deposition by one order of magnitude. These films could be crystallized by post-annealing in air at 200 °C. Photoinduced decomposition of acetaldehyde and photoinduced hydrophilicity was successfully demonstrated.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.