Abstract
Thin dust layers have been elaborated by plasma enhanced chemical vapor deposition (PECVD) in a parallel plates reactor using hexamethyldisiloxane (HMDSO) vapors. The chemical and physical properties of the obtained coating were discussed using Fourier transform infrared spectroscopy (FTIR) and scanning electron microscopy (SEM). The performed characterizations show a significant impact of the deposition time on powders (NPs) composition and the organic groups concentration in particles such as Si(CH3)2, Si(CH3)3 and Si(CH3)x increases when increasing the time deposition.
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