Abstract
ABSTRACT Vitreous inorganic photoresists were prepared using plasma enhanced chemical vapor deposition processes in order to match the deposit method to industrial requirements (throughput, area to be covered, deposition rate, integration in a dry process). Their specific morphology (phase separation) resulted in lithographic characteristics (development rate, edges of pattern) related to the composition of the glass. The fineness of the microstructure of germanium-rich glasses (GeSe3) gives them resolution compatible with submicron lithography.
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