Planarization techniques for vertically integrated metallic MEMS on silicon foundry circuits

Abstract

Various micromachining techniques exist to realize integrated microelectromechanical systems (MEMS), which include sensors, signal processing and/or driving circuits, and/or actuators in one small die. Post-processing techniques performed on foundry-fabricated circuits (e.g., MOSIS) are attractive since such an approach eliminates the need for an in-house integrated circuit fabrication line to produce integrated MEMS. A method based on the combination of metallic (e.g., electroplating) micromachining techniques with multichip module deposited (MCM-D) processes is a possible candidate to realize vertically-stacked integrated MEMS using the post-processing of integrated circuits (post-IC) approach. In order to realize such devices, planarization of the surface of foundry-fabricated circuit chips or wafers is often required. In such planarization layers, mechanical and chemical stability, as well as adhesion between the circuit-containing substrate and the micromachined devices, should be addressed. A PI/BCB/PI sandwich interlayer system, which utilizes both advantages of DuPont polyimide PI 2611 and Dow benzocyclobutene (BCB) Cyclotene 3022 series, was developed as a planarization interlayer for vertically integrated MEMS. The PI/BCB/PI interlayer system shows an over 95% degree of planarization (DOP) as well as passes the Method 107G Thermal Shock from the military standard MIL-STD-202F. A interlayer system was also developed as an alternative to the PI/BCB/PI system.