Abstract
A quantitative characterization of residual stresses was performed with a nanometricspatial resolution in Er/Ge-doped silica glass fibres. Stresses were assessed by apiezo-spectroscopic technique (i.e., monitoring wavelength shifts), which used theelectro-stimulated luminescence of optically active defects in silica glass. Residual stressesof GPa magnitude were found near the core/cladding interface by using a nanometre-sizedelectron probe. Diffusion of Er/Ge ions from the core towards the cladding area was clearlyobserved in this optical device and the occurrence of this diffusive phenomenon permittedstress measurement in extended cladding regions beyond the core/cladding interface. Adiscussion is given of the impact of residual stresses on the optical performance of the fibredevice.
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