Abstract

Picosecond photoconductivity in polycrystalline gallium arsenide (GaAs) layers grown on silicon dioxide by molecular beam epitaxy has been investigated. Photocurrent transient responses having full width at half-maximum of ∼2.2 ps were measured by photoconductive sampling techniques. Interdigitated metal-semiconductor-metal photodiodes have been fabricated from the polycrystalline GaAs with 1.5- and 5-μm electrode spacing. The corresponding responsivities measured are 40 mA/W and 0.15 A/W, respectively, at 10 V/μm bias voltage and 820-nm wavelength. The corresponding effective mobility of this material is estimated to be μeff∼80 cm2/V s, making this photodetector competitive with alternative technologies for ultrahigh speed applications.

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