Abstract
Capacitively coupled octafluorocyclobutane (C4F8) plasma was used to synthesize fluorocarbon films on low-density polyethylene, which was surface-crosslinked by treatment with inductively coupled Ar plasma. The dependence of the thickness, surface morphology, and chemical characteristics of the fluorocarbon films on the plasma power was studied under different plasma conditions. Significantly lower deposition rates were obtained under the sole effect of uncharged particles (shielded plasma conditions). Microscale and nanoscale film growth characteristics were examined at different levels of energy/monomer mass. A significant increase in hydrophobicity was observed under shielded plasma conditions as a result of the higher fluorine concentrations of the deposited films. The film chemical structures were interpreted in terms of the degree of crosslinking. Increasing the exposure of polyethylene to the shielded plasma conditions resulted in the formation of fluorocarbon films with hybrid chemical structures consisting of a crosslinked interfacial layer covalently bonded to the polymer substrate and a hydrophobic compliant surface layer rich in CF2 groups. The results of this study illustrate the potential of shielded plasma treatment to tailor the chemical structure of thin fluorocarbon films.
Published Version
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