Physical and mechanical properties of Ti 1 − xSi xN films

Abstract

Ti 1 − x Si x N coatings with 0 <- x <- 0.30 and thicknesses ranging from 1.2 to 3.3 μm, were deposited on to polished high-speed steel substrates by r.f. reactive magnetron sputtering. The atomic composition of the samples was measured by Rutherford backscatering spectrometry (RBS), and the texture was determined by X-ray diffraction (XRD). Great improvements in hardness and adhesion behaviour were obtained when compared to TiN. Hardness results and adhesion behaviour as a function of the Si content will be shown and discussed. The Ti 0.85Si 0.15N sample presented the best results with a hardness value of about 36 GPa and a critical load for total failure around 70 N.