Abstract
Inverse photosensitivity is a sought-after property for the development of photonic devices and non-volatile memories with low power conversion. Herein, we report on the development of a superstrate-type thin film junction exhibiting inverse photosensitivity which does not involve the use of a pricy transparent conducting oxide layer, providing a method for engineering low-cost thin film devices. Sequential ionic layer adsorption reaction (SILAR) was used to grow Copper Zinc Tin Sulphide (CZTS) and Cadmium sulphide (CdS) large area thin film p-n diode junction. Uniform CZTS thin films with an area of ∼10 cm2 which were free of pin holes or voids could be deposited using an optimized SILAR process recipe. The grown CZTS films exhibited an electrical resistivity of 4.4 × 10−4 Ωm using silver (Ag) electrodes. CdS thin films were sub-sequentially grown over the CZTS layer to form a p-n junction. A knee voltage of 0.2 V in the device configuration “glass/CZTS/CdS/Ag” was observed in the current voltage characteristics. The as-prepared and the vacuum-annealed p-n junction exhibited negative photosensitivity of magnitude 0.21 and 0.16 respectively. The air-annealed device structure exhibited photosensitivity of 216.
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