Photoresponse of an oxide semiconductor photosensor

Abstract

The authors investigated the photoresponse of a double-layer oxide semiconductor (GaInZnO–InZnO) thin-film transistor (TFT) under illumination, where the photocurrent in the negative gate bias region increased significantly without a negative shift in the threshold voltage. In particular, in the forward gate bias sweep direction (from −VG to +VG), the hysteresis of the transfer curves of the photosensor TFT became pronounced when the negative gate bias and its duration were increased. Additionally, the photocurrent level of the TFT remained almost the same as the level measured using a DC reverse gate bias sweep mode (from +VG to −VG). An analysis of the transfer curves, capacitance–voltage curves, and energy band diagrams indicates that the hysteresis characteristics can be explained by the competing effects of electrical-stress-induced defect generation and the screening of the negative gate bias by doubly positively charged oxygen vacancies depending on the gate bias polarity. In particular, the origin of the photoresponse of the photosensor TFT under illumination was studied intensively by qualitative analysis.