Photoresist-free, laser-assisted chemical etching process for long-period fiber grating.

Abstract

In this study, we propose a photoresist-free, laser-assisted wet chemical etching process used to control the grating depth of a long-period fiber grating (LPFG) termed laser-assisted etching LPFG (LLPFG). This process can considerably reduce production time, while the photoresist-free laser etching allows tiny long-period notches to be etched on the fiber surface, distinguishing the etching rate of the process from that of standard wet etching processes. The LLPFG, which has a period of 610 µm, was scanned using a KrF excimer laser. The results showed a resonant-attenuation wavelength of 1551 nm through a fiber diameter of 60 µm and a grating depth of 26 µm and to being a green process due to the photoresist-free etching.