Photopolymerization kinetics, photorheology and photoplasticity of thiol–ene–allylic sulfide networks

Abstract

AbstractBACKGROUND: Thiol–ene networks are of interest due to their facile photopolymerization and their open network structure. In this work, an allylic disulphide divinyl ether monomer is reacted with tetrathiol and divinyl ether monomers, which allows the network structure to permanently change in shape if stressed while under irradiation. We also study the photo‐differential scanning calorimetry (DSC) kinetics and photorheology during cure and the dynamic mechanical properties after cure.RESULTS: The heat of polymerization is similar for the thiol–ene systems and suggests ca 80% conversion of the vinyl ether groups. An increase in the initiator concentration increases the photocure rate as expected. The activation energy for photopolymerization is 7.6 kJ mol−1. DSC and rheometry studies show that the polymerization kinetics is slowed by the addition of the allylic disulfide divinyl possibly due to the formation of less reactive radicals. However, as shown by dynamic mechanical thermal analysis, the network structure is not changed very much by addition of this monomer. If radicals are generated by irradiation of a photoinitiator in the network while a stress is being applied, the polymer will permanently deform depending on the fraction of 2‐methylenepropane‐1,3‐di(thioethyl vinyl ether) in the network, due to a bond interchange reaction.CONCLUSION: The rate of thiol–ene reaction is slowed by the addition of the allylic disulfide divinyl ether. Photoplasticity is observed in the networks containing the allylic disulfide groups. Further work is required to optimize the extent of photoplasticity in these systems. Copyright © 2007 Society of Chemical Industry