Abstract
The main regularities of the photochemical oxidation of arsenic (III) were studied using a mercury-free UV source KrCl excilamp (222 nm). Comparative studies of the effectiveness of direct photolysis and combined oxidation of arsenic (III) in the presence of hydrogen peroxide were performed. It was found that the combined treatment of {UV / H2O2 } achieves a significant intensification of the oxidation process. The considered oxidizing systems according to the oxidation state of As (III) can be ranked according to {UV/H2O2 }>{H2O2 }>{UV}. The ion-radical mechanism of the photochemical oxidation of arsenic in the combined {UV / H2O2} oxidation system using the UV radiation of the KrCl excilamp is proposed. The fundamental possibility of using a mercury-free source of quasi-monochromatic radiation of the KrCl excilamp (222 nm) for the photochemical process based on the combined oxidation system {UV / H2O2} to remove arsenic from aqueous solutions is established.
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