Abstract
A method for the fabrication of 2D periodic structures by contact optical photolithography with image inversion is reported. The optical properties of photonic crystals and Bragg gratings for mid-IR and terahertz emitters are considered. The possibility of raising the integral emission intensity of light-emitting diodes for the mid-IR spectral range is demonstrated. The requirements to gratings for the output of terahertz emission generated by surface plasmons excited in layers of narrow-gap degenerate semiconductors with an accumulation layer are determined.
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