Abstract

We present results of fabrication and implementation of thin polydimethylsiloxane (PDMS) membranes with patterned surface for the light emitting diode (LED). PDMS membranes were patterned by using the interference lithography in combination with embossing technique. Two-dimensional photonic crystal and photonic quasicrystal structures with different period were patterned in the surface of thin PDMS membranes with depth up to 550nm. Patterned PDMS membranes placed on the LED chip effectively diffracted light and increased angular emission of LED radiation pattern. We presented effective technique for fabrication of patterned PDMS membranes, which could modify the emission properties of optoelectronic devices and can be applied directly on surface LEDs and small optical devices.

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