Photoluminescence from silicon nanocrystals embedded in silicon nitride fabricated by low-pressure chemical vapor deposition followed by high-temperature annealing

Abstract

The photoluminescence (PL) from silicon nanocrystals (Si-ncs) embedded in an amorphous silicon nitride matrix was examined both experimentally and through theoretical simulations. The film was prepared using low-pressure chemical vapor deposition with subsequent high-temperature annealing. The experimental parameters required for the PL modeling were determined using Raman spectroscopy. A novel method to estimate the nitrogen content, which allowed the determination of both the Urbach energy and the Tauc gap, was reported. The luminescence could be attributed to different origins, namely, Si-ncs, amorphous silicon nanodots, nitrogen and silicon defects, and amorphous matrix. A comparison between the experimental results and the modeling indicated that the existing models are unable to satisfactorily explain the observed PL.