Abstract
Growth of In0.52Al0.48As epilayers on InP (100) substrates by molecular beam epitaxy at different silicon doping levels is carried out. The doped samples show an inverted S-shaped dependence of the PL peak energy variation with the temperature which weakens at high doping levels due to a possible reduction in the donor binding energy. There is a reduction in both the AlAs-like and InAs-like longitudinal-optic (LO) phonon frequencies and a broadening of the LO phonon line shape as the doping level is increased. The PL intensity also showed in increasing degrees at higher doping levels, a temperature dependence which is characteristic of disordered and amorphous materials.
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