Abstract
Photooxygenation of glycolic and glyoxalic acids proceeds only when catalyzed by ferric ions or sensitized by a high-energy triplet sensitizer. The photooxidation products of both substrates are formic acid and carbon dioxide (to different extents and in different ratios). Photolysis (under N 2) is not influenced by ferric ions; formaldehyde + carbon monoxide and formaldehyde + carbon dioxide are the photolytic products of glycolic and glyoxalic acids, respectively. The quantum yield and reaction rate constant for photooxidation of glyoxalic acid have been determined, and mechanisms for the oxidation of both substrates are proposed.
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