Abstract
SiOx:OH films containing a high concentration of Si-OH bonds deposited by using a direct current (DC) reactive magnetron sputtering with added H2O. We have discussed the photocatalytic characteristics of SiOx:OH/TiO2 multi-layer films, in which various SiOx:OH films were deposited onto photocatalytic TiO2 films. As a result, ultra-hydrophilic properties were observed under ultraviolet (UV) irradiation of 10 μW/cm2. The concentration of hydrogen in the SiOx:OH films could be controlled by changing the pressure of H2O that was used during the process. The hydrogen in the layers is believed to take the form of either Si-OH or H2O bonds; however, the Si-OH bonding dominates. The hydrophilic properties of the layers are considered to be improved by the presence of the -OH groups in the SiOx:OH film.
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