Comparable study on the effect of diluted NH 4Cl solution on the postdeposition surface texture of as-deposited aluminum-doped zinc oxide films by direct current pulse and direct current reactive magnetron sputtering

Abstract

Effect of 5.0% diluted NH 4Cl aqueous solution was comparably investigated on the postdeposition surface texture of the as-deposited smooth aluminum-doped zinc oxide (AZO) films by direct current pulse reactive magnetron sputtering (DCP-sputtering) and direct current reactive magnetron sputtering (DC-sputtering). The as-deposited AZO films by DCP-sputtering showed an effective surface texture for light trapping upon the etching of 5.0% diluted NH 4Cl solution, while the as-deposited AZO films by DC-sputtering demonstrated an obscure surface texture upon the same etching treatment. The different result might be attributable to a big difference in film strain and film compactness. The formation of interstitial Zn, interstitial Al and grain boundary is the key to realize effective surface texture for the as-deposited AZO films.