Abstract
ABSTRACTThe sensitivity of the laser-controlled aqueous etching to the optical and electrical properties of semiconductors was utilized during the etching of n-GaAs/n-AlGaAs multilayers to produce novel microstructures. Since this process is controlled by the transport of photogenerated holes to the semiconductor/solution interface, we found that the morphology of etched features is dependent on the bandgap and hole diffusion length of each layer within the heterostructure.
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