Abstract
TiO2−xNx films were deposited on ITO glass by reactive dc magnetron sputtering method under different O2/N2 flow ratios. A NiO film was deposited by chemical bath deposition onto the as-prepared ITO/TiO2−xNx film to form an ITO/TiO2−xNx/NiO composite electrode. The morphology, crystal structure and composition of the TiO2−xNx films were characterized by SEM, XRD and XPS. The photoelectrochemical properties of the TiO2−xNx films were investigated by means of UV–Vis absorption spectra and photocurrent measurements. The results showed that the TiO2−xNx film sputtered under O2/N2 flow ratio of 1:2 exhibited a higher photocurrent response than the others. Correspondingly, the TiO2−xNx/NiO electrode consisting of the sputtered TiO2−xNx film under O2/N2 flow ratio of 1:2 also showed the best photoelectrochromic feature.
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