Abstract
Ni-doped CuO nanorods were grown on a CuO film buffered with a FTO substrate using different nickel amounts via the modified chemical bath deposition method. We investigated the effect of the Ni doping concentration on the morphological, optical, structural and photoelectrochemical properties of the Ni-doped CuO nanorods. In this study, the maximum photocurrent density of −1.75mA/cm2 at −0.55V (vs. SCE) was obtained from the Ni-doped CuO photoelectrode with a Ni doping concentration of 1at.% and an effective route to improve the photocurrent density of the CuO photoelectrode was proposed.
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