Photoelectrochemical Polymerization of Pyrrole on ZnO and Its Application to Conducting Pattern Generation

Abstract

Polypyrrole film was photoelectrochemically deposited on semiconductor electrode. Deposition efficiency of polypyrrole was about one‐third of that by the conventional electrochemical polymerization because photodissolution of occurred competitively consuming photogenerated holes in the valence band of . Though photodissolution of was suppressed with polypyrrole film on the electrode surface, the coverage was imperfect and the photodissolution was still observable. Three different methods in area‐selective deposition of polypyrrole were successfully achieved. In two methods out of the three, was used as an inorganic photoresist material.