Abstract
Photodissociation thresholds of OH from CH 3OH in solid Ne and Ar were determined via photolysis of CH 3OH/Ne and CH 3OH/Ar (1/200) samples in situ at 4 K. The samples were irradiated with VUV synchrotron radiation after dispersion by a Seya-Namioka monochromator. The OH photo-product was detected by means of laser-induced fluorescence technique. The increase of fluorescent intensity of OH was monitored and recorded after the matrix sample was irradiated at different wavelengths for 3–5 min. Photodissociation threshold energies of 7.13±0.02 eV (174.0±0.5 nm) and 7.08±0.04 eV (175.0±1.0 nm) were measured for OH production of CH 3OH in solid Ne and Ar, respectively.
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