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Abstract
The photodegradation of polysilanes was investigated by far-infrared spectroscopy. The band intensity of asymmetric and symmetric Si–Si stretching vibration of poly(methylphenylsilylene) was decreased by UV-irradiation. The formation of the Si-branching structure in the UV-irradiated poly(methylphenylsilylene) was suggested. Poly(phenylsilyne) showed stability of the Si rings during the photodegradation.
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