Abstract
The photodegradation of poly(methyl methacrylate) has been investigated by electron spin resonance and viscosity measurements. On UV irradiation of poly(methyl methacrylate) film at 40°C in either a vacuum or in air, radicals were produced. Although the observed radical concentration in air is considerably different from that in a vacuum, the number of radicals responsible for the chain scission processes were almost the same in both cases. When the polymer film is irradiated with light of wavelength longer than 290 nm, radical formation is suppressed and the viscosity average molecular weight remains unchanged. The photodegradation has also been examined for poly(methyl methacrylate) films containing benzophenone and 2-hydroxy-4-methoxybenzophenone. Both additives were found to act as protective agents for the polymer. A mechanism of protection by these additives against photodegradation is proposed on the basis of the experimental results.
Published Version
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