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Abstract
Titanium tetrachloride was used to synthesize titanium dioxide emulsion by the hydrolysis process. The semiconductor was deposited on raw unglazed ceramic and silicon substrate by the reactive chemical spraying process. The experimental conditions were chosen to ensure film adhesion. Obtained films were calcined at different temperatures ranging from 600∘C to 680∘C and characterized by X-ray diffraction, atomic force microscopy, optical measurement, contact angle measurement, and scratch test. The photocatalytic test was carried out under UV irradiation using an azo dye. The silicon substrate allowed to show the film structure. The AFM observation indicated that film roughness increased from 12[Formula: see text]nm to 32[Formula: see text]nm. Roughness growth corresponds to a large active surface and enhanced photocatalyst activity. During the photocatalyst test under UV irradiation, the sample calcined at 660∘C shows the best result with a degradation efficiency of 140[Formula: see text]mg[Formula: see text][Formula: see text][Formula: see text][Formula: see text]. The same sample was characterized by hydrophilic behavior and adhesion strength.
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