Abstract
TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Titanium (IV) isopropoxide mixture with oxygen was used as the working gas. Films were deposited on glass and silicon substrates. Photocatalytic activity and photoinduced hydrophilicity of the films were investigated in dependence on experimental conditions. The films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). Photocatalytic properties of the films were strongly influenced by ion bombardment and deposition temperature. The film with anatase crystalline structure and with high photocatalytic activity was deposited at 120 °C under low energy ion bombardment.
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