Photocatalytic removal of some selected antibiotics in polluted water system by graphitic carbon nitride-enhanced vanadium ferrite (VFe2O4@g-C3N4)

Abstract

Antibiotics such as sulfamethoxazole (SUF), ciprofloxacin (CIP) and erythromycin (ERY) are frequently detected in water systems without being efficiently removed during water treatment. This study synthesized a graphitic carbon nitride-enhanced vanadium ferrite (VFe2O4@g-C3N4) as a photocatalyst for degrading SUF, CIP and ERY in an aqueous solution. VFe2O4@g-C3N4 was characterized with X-ray diffractometry (XRD), thermogravimetry analysis (TGA), ultraviolet (UV)-visible spectrophotometry, scanning electron microscope (SEM) and transmission electron microscope (TEM). The XRD characterization of VFe2O4@g-C3N4 revealed diffraction patterns with a crystallite size of 22.45 nm and a bandgap energy of 1.94 eV. The SEM image revealed the surface to be rough with irregular particle shape and size. The TEM image showed an average particle size of 92.47 nm. VFe2O4@g-C3N4 exhibited a degradation efficiency, which showed complete removal of SUF (100 %) from solution while the efficiency towards CIP is 94 ± 0.60 % and 90 ± 0.8 % towards ERY. The best photocatalytic performance was achieved with 0.12 g L−1 of VFe2O4@g-C3N4 and pH = 7.0 as the optimal conditions for achieving complete removal of SUF, CIP and ERY at a concentration lower than 10.00 mg L−1 under visible-light irradiation. The photodegradation of SUF, CIP and ERY by VFe2O4@g-C3N4 was found to be promoted by ROS with ˙OH and SO4˙− radicals playing a significant role. VFe2O4@g-C3N4 demonstrated a regeneration capacity that is above 90 % at the 10th cycle of regeneration treatment, suggesting it to be stable and reusable with the X-ray diffraction pattern remaining unchanged and no leaching of VFe2O4@g-C3N4 into solution. The result from the study reveals VFe2O4@g-C3N4 as a promising photocatalyst for removing antibiotics from an aqueous solution.