Abstract
TiO2 thin films were deposited by the bipolar pulsed magnetron sputtering of a Ti target at low working pressure (1mTorr) and various Ar and O2 flow ratios. (The Ar flow rate was fixed at 30sccm.) The effects of the Cr implantation fluence on the crystal structure, surface microstructure, and optical and photocatalytic properties of Cr-implanted TiO2 films were investigated. The structure and composition of the films were characterized by grazing-incidence X-ray diffraction and X-ray photoelectron spectroscopy. The surface morphology of the films was characterized by field emission scanning electron microscopy. The optical properties were determined by UV–VIS transmission spectroscopy. The photocatalytic properties of the films were analyzed by the de-colorization of methylene blue with UV and visible light. Experimental results show that the implantation of a moderate amount of Cr with a fluence of 5×1015 in the TiO2 film preserves the anatase crystal structure and modifies the film in a manner that favors its photocatalytic properties.
Published Version
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