Abstract
Abstract In this research, SiO2/TiO2/SiO2 nanostructured thin films were deposited on glass substrates using an electron beam physical vapor deposition technique. The structure, morphology, surface composition, hydrophilic and photocatalytic properties of the thin film were investigated by means of X-ray diffraction, field emission scanning electron microscopy, X-ray photoelectron spectroscopy, water contact angle measurements and methylene blue degradation. The results indicated that SiO2/TiO2/SiO2 nanostructured thin film shows superhydrophilic and photocatalytic properties which greatly encourage the self-cleaning function of the film.
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