PhC and PQC patterned by interference lithography in photoresist surface

Abstract

In this paper we present fabrication process of photonic crystal (PhC) and photonic quasicrystal (PQC) structures in thin photoresist layer on glass substrate. For fabrication, we used laser interference lithography in Mach-Zehnder configuration. One-dimensional (1D), two-dimensional (2D) PhC and PQC relief structures of period 1600 nm were prepared in photoresist layer with depth up to 1100 nm. Quality of the prepared structures was confirmed from confocal laser microscope analysis and also from diffraction measurements.