Abstract
This contribution presents experimental results in the field of planar two-dimensional (2D) photonic crystal (PhC) structures, as well as their design, fabrication and analysis. We demonstrate maskless optical methods leading to fabrication of 2D PhC structures for applications in optoelectronics. The 2D PhC structures of square and triangular symmetries with period from 275 nm to 2 μm were fabricated in thin photoresist layer, III-V semiconductor surfaces and polymethylmethacrylate using interference lithography and near-field scanning optical microscope lithography. The 2D PhC structures prepared in GaAs surface were used as a mold for nanoimprint lithography in polymethylmethacrylate.
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