Year-end Sale % OFF 
Abstract
Two different microfabrication techniques for the preparation of monolithic porous polymeric 3D microstructures were assessed. The first approach is based on a radiation assisted imprint process. Electron beam initiated free radical polymerisation of acrylates/methacrylates in a porogenic solvent within the confinements of V-shaped microgrooves in a silicon master enables the pattern transfer, thereby phase separation allows for the generation of a porous material of the replicate simultaneously. Furthermore, porous 3D microstructures in the format of arrays with different feature sizes in the range of 50 to 1000 micrometers were obtained by UV exposure of a liquid film of acrylates/methacrylates in a porogenic solvent through a photomask. In this paper we present the first results regarding the combined pattern transfer and polymerisation-phase separation process in the micrometer range. Microstructures and the dimension of pores and globules within these microstructures were analysed by scanning electron microscopy.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
