Abstract
Two different microfabrication techniques for the preparation of monolithic porous polymeric 3D microstructures were assessed. The first approach is based on a radiation assisted imprint process. Electron beam initiated free radical polymerisation of acrylates/methacrylates in a porogenic solvent within the confinements of V-shaped microgrooves in a silicon master enables the pattern transfer, thereby phase separation allows for the generation of a porous material of the replicate simultaneously. Furthermore, porous 3D microstructures in the format of arrays with different feature sizes in the range of 50 to 1000 micrometers were obtained by UV exposure of a liquid film of acrylates/methacrylates in a porogenic solvent through a photomask. In this paper we present the first results regarding the combined pattern transfer and polymerisation-phase separation process in the micrometer range. Microstructures and the dimension of pores and globules within these microstructures were analysed by scanning electron microscopy.
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