Phase-separated polydimethylsiloxane as a dielectric surface treatment layer for organic field effect transistors

Abstract

We suggest a novel method for treating the surfaces of dielectric layers in organic field effect transistors (OFETs). In this method, a blend of poly(9,9-dioctylfluorene-alt-bithiophene) (F8T2) and dimethylsiloxane (DMS) with a curing agent is spin coated onto the surface of a dielectric substrate, silicon oxide (SiO 2), and then thermally cured. X-ray photoelectron spectroscopy, contact angle measurements, and morphology analysis were used to show that the hydrophilic DMS layer is preferentially adsorbed on the SiO 2 substrate during the spin coating process. After thermal curing, the bottom DMS layer becomes a hydrophobic PDMS layer. This bottom PDMS layer becomes thinner during curing due to the upward motion of the hydrophobic PDMS molecules. The FET mobility of the cured system was 10 −2 cm 2/Vs, which is similar to that of polymeric semiconductors on octadecyltrichlorosilane treated SiO 2 dielectric layers. We also discuss the possibility of using this blend method to increase the air-stability of polymeric semiconductors.