Abstract
AbstractThe semiconductor industry uses PFC gases such as CF4 and C2F6 as etchant and cleaning gases during plasma processes. The gases do not fully react within the reactor chamber. The unused gases enter the atmosphere through the process effluent. These gases have long persistence in the atmosphere and absorb infrared radiation. The PFC gases are, therefore, potential global warming gases. A method is described that will recover and recycle PFC gases.
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