Perpendicular giant magnetoresistance of Co/Cu multilayers on V-grooved substrates: Dependence on deposition method

Abstract

The perpendicular giant magnetoresistance of Co/Cu multilayers grown at an angle onto V-grooved InP substrates is studied using two different deposition techniques. Samples are grown both at ultra-high vacuum in a molecular beam epitaxy system and in a classical high vacuum electron beam evaporation system. Using the two spin-channel model for electron transport, the spin-asymmetry parameters were determined. The absolute value and temperature behavior of the spin-asymmetry parameters of the Co bulk scattering and the interface scattering are comparable for both series. We find that the interface scattering of the e-beam evaporated multilayers is relatively less spin-dependent.