Abstract
The fabrication of periodic nanostructures on noble metals as surface enhanced Raman scattering (SERS) substrate is still challenging through facile and cost-effective process. Dynamic lithography under AFM tapping mode has been applied to the fabrication of nanogrooves on single-crystal copper to reduce the feature size. However, there was a lack of fundamental understanding of the effect of the fabrication of periodic nanostructures due to dynamic lithography and then SERS enhancement. To this end, this study aims to investigate the variation of the energy dissipation and the corresponding fabricated nanogrooves at different laser spot positions. It was found that improper laser position was contributed to the increased energy dissipation and irregular nanogrooves were thus obtained with much larger machined depth. On the contrary, at the optimal laser position, the minimal sensitivity was associated with the maximum voltage value on the photodiode. In this case, regular nanogrooves with controlled feature size can be produced for the fabrication of periodic nanostructures. And checkerboard nanodots with a period of 200 nm were fabricated by the combination of arrays of nanogrooves, which indicated advantages of high stability for AFM dynamic lithography. In addition, rhodamine 6G (R6G) was selected as the detecting target to measure SERS spectra of fabricated substrates. Results indicated the Raman enhancement factors can be promoted due to uniform shape of nanogroove and high resolution in horizon dimension.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.