Abstract
An x-ray reflectivity measurement system has been installed in the bending-magnet beamline, named BL15, at the Saga Light Source. This beamline provides synchrotron radiation in the energy range from 2.1 to 23 keV for the performance of x-ray diffraction experiments, x-ray reflectivity measurements, etc. To test the performance of this reflectivity measurement system, we have analyzed the interface of thin films with nanometer-scale thickness on semiconductor substrates. The reflectivity of the order of 10-7 has been observed for a 50-nm thick film of thermal SiO2 on a Si wafer. We have fitted the calculated reflectivity profile with a single layer model to the data, and have obtained the value of thickness. In addition, we have performed grazing-incidence small-angle x-ray scattering (GISAXS) experiments on a MnPt thin film.
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