Performance and Analysis of Voltage Scaled Repeaters for Multi-Walled Carbon Nanotubes as VLSI Interconnects

Abstract

Multi-walled carbon nanotubes (MWCNT) are promising candidates for futuristic Nano-electronic applications. MWCNT have potential to replace on-chip copper (Cu) interconnects due to their large conductivity and current carrying capabilities. Delay is one of the major design constraints in very large scale integration (VLSI) circuits. This paper presents an analysis of propagation delay and effect of repeater insertion on propagation delay for both MWCNT and Cu interconnects at different technology nodes viz 32nm and 22nm. In addition this paper deals with effect of voltage scaling in repeaters for long interconnects length in VLSI circuits in terms as propagation delay. It has been observed that propagation delay reduces with increase in bias voltage of the repeater at different interconnects length and technology nodes (32nm.22nm).