Patterning of Polymer Brushes. A Direct Approach to Complex, Sub-Surface Structures

Abstract

We report a unique method to directly fabricate complex polymer brush structures with nanometer scale features by means of electron beam lithography. Polymer brushes for direct patterning were grown from surface-anchored initiator sites using atom transfer radical polymerization. Selected monomers (poly(2-hydroxyethyl methacrylate) and poly(methyl methacrylate)) were used based on their ability to readily scission when exposed to radiation. Single step direct patterning of polymer brushes is attractive as this eliminates many process steps, reducing the possibility of contamination and possibly improving resolution. In addition, we report a method to form subsurface polymer brush channels with nanometer-scale features. With the chains tethered to a surface, a diblock copolymer brush with a negative tone upper layer (polystyrene) and a positive tone under layer (poly(methyl methacrylate)) or (poly(2-hydroxyethyl methacrylate) were patterned to create channels. In the work presented, the direct electron beam patterning behavior of the brushes was studied and fabrication of nanochannels was demonstrated. Imaging of the nanopatterned surfaces was carried out using atomic force microscopy and fluorescence microscopy.