Patterning of Nanoparticle Arrays by Self-assembly Lithography

Abstract

Nanoparticle arrays have been patterned using sub-micron sphere self-assembly lithography technique. 2D crystal self-assembled closed-packed monolayer of polystyrene spheres were formed and used as deposition masks. Nanoparticle arrays of hexagonal lattice of triangular dots were created by sputtering metal thin films through the sub-micron sphere mask. The mask was lifted off by sonication with tetrahydrofuran (THF). The metal thin films deposited through the interstitial areas forms the arrays of triangular elements. Structural characteristic including size and shape was performed by scanning electron microscope (SEM). The effect of sputtering power and polystyrene sphere sizes on the nanoparticle arrays was explored.